Particle detection at the 0.1 mu m level has become increasingly important in producing reliable devices that demand smaller line widths. However, because the position alignment accuracy between the commercial optical particle inspection system and the particle evaluation instrument is insufficient, it is extremely difficult to detect 0.1 mu m size particles. To solve these problems, we have succeeded in increasing the coordinate positioning accuracy at the 0.1 mu m level by combining a large sample atomic force microscope (G. Bing, C. F. Quate and Ch. Gerber, Phys. Rev. Lett., 56 (1986) 930) with an optical scattering system. Using this system, we can now observe defects and particles on bare wafers and the possibility of particle detection is virtually 1.00%. Furthermore, the observation time necessary to position on a particle is substantially reduced.