Tl2O3 films were electrodeposited onto ITO (indium tin oxide) substrates at different current densities. X-ray diffraction (XRD) studies reveal that the obtained film is amorphous at low electrodeposition current densities, while at high current densities it is polycrystalline. The polycrystalline to amorphous transformation takes place when the electrodeposition current density increases to 0.70-0.75 mA cm(-2) in our experimental conditions. SEM observations show that the polycrystalline film grows at a preferred orientation vertical to the substrate, while the amorphous one exhibits no ordered growth. Visible absorption spectrum measurements show a blue shift and an enhancement of the absorption intensity for the amorphous film, which can be attributed to the quantized size effect of Tl2O3 nanoparticles in the film. The resistivity of the polycrystalline film is lower than that of the amorphous film. These results are of importance to the electrodeposition of Tl2O3 superlattices and of high-temperature superconducting films based on the anodic oxidation of Tl+ ions.