Thin Solid Films, Vol.299, No.1-2, 63-66, 1997
Thin-Film Preparation of Oligomeric Si-Phthalocyanines - Thermal-Stability and Sublimation Behavior
The thermal stability of rod-like phthalocyanines of the general formula R3SiO(SiPcO)(n)SiR3 with n = 1-4 and R = C6H13 was studied by temperature dependent mass spectrometry and X-ray photoemission spectroscopy. The stability of the monomer, dimer, and trimer is high, whereas the tetramer is thermally unstable and therefore cannot be used for thin film preparation by sublimation.
Keywords:SILICON