Thin Solid Films, Vol.303, No.1-2, 17-26, 1997
Lamno3 Perovskite Thin-Film Deposition, from Aqueous Nitrate Solutions of La and Mn, in a Low-Pressure Plasma Expanded Through a Nozzle (Petn)
A new low-pressure plasma coating process was developed using an inductively coupled radio-frequency plasma, expanded through a nozzle (PETN) and aqueous metallic salt injection in a pulsating mode. LaMnO3.15 perovskites were deposited on quartz and YSZ substrates, in an Ar+O-2 plasma using La(NO3)(3) and Mn(NO3)(2) aqueous precursors. The microcrystalline structure of the deposits was investigated by X-ray diffraction (XRD) and transmission electron microscopy (TEM)-XRD. The aerosol passing the r.f. Ar+O-2 plasma produces a shock wave prior to the nozzle, evaporating the excess H2O and decomposing the water and nitrate compounds. The molecular spectra of LaO, MnO and OH show that the high reactive plasma medium combined with a shock wave, accelerate the dissociation oxidation kinetics. These results were confirmed by quadrupole mass spectrometry measurements. Laser doppler anemometry measurements also showed a regular and reproducible pulsed injection.