In this article, titanium oxide films were prepared by ion beam enhanced deposition where titanium was evaporated by electron beam and simultaneously bombarded with xenon ion beams at an energy of 40 keV in an O-2 environment. X-ray photoelectron spectroscopy and Auger electron spectroscopy were used to research the chemical state and composition of the titanium oxide films. The results show that surface of the film was fully oxidized. After the surface was removed by argon ion sputtering, the results show that Ti2+, Ti3+ and Ti4+ states exist on the sputtered surface. The atomic concentration of all the three titanium states were calculated. The chemical shift of O Is peak was also observed on the near surface.