Titanium aluminide thin films have been deposited on quartz plates by DC magnetron sputtering with a solenoid coil. A round shaped Ti and Al complex disk was employed as a target. In our sputtering system, because the spatial position of plasma on the target surface can be controlled by the solenoid coil current, the in-depth concentration profile of Ti and Al can be controlled by changing the solenoid coil current. Highly oriented Ti3Al, TiAl and TiAl3 films were synthesized from one complex Ti and Al target at 400 degrees C by changing the solenoid coil current. Gradient composite him of these titanium aluminides could also be fabricated by changing the solenoid coil current.