LiNbO3 films were prepared by a thermal plasma spray chemical vapor deposition method using liquid source material. Preferentially (110)-oriented LiNbO3 films were obtained on sapphire (110) substrates with the deposition rate of 0.1 mu m/min, which was 10-100 times faster than those of other conventional vapor phase deposition methods. Moreover, large-area deposition over a 5-inch diameter could also be confirmed. These results demonstrate the effectiveness of this method for high-rate, large-area deposition of LiNbO3 films.