Thin Solid Films, Vol.319, No.1-2, 92-96, 1998
Application of focused ion beam milling to cross-sectional TEM specimen preparation of industrial materials including heterointerfaces
Specimen preparation is always a crucial question of transmission electron microscope (TEM) investigation Recently new specimen preparation technique using focused ion beam (FIB) milling was developed. We applied this technique to the fabrication of cross-sectional TEM specimens of industrial materials including heterointerfaces. The following investigations were carried out: multilayered structures in thin-film transistors for the liquid crystal display, interfaces in a hot dip galvanized steel and microstructures of a diamond Nm on silicon nitride. The largest benefit of FIB lies in its application to heterointerface analysis at a particular position in submicron scale. This technique extends the use of TEM analysis into new areas of. characterization of ind;strial materials.
Keywords:focused ion beam (FIB);transmission electron microscope (TEM);thin-film transistor (TFT);galvanized steel;diamond film