The Co coatings were produced with the aid of the vacuum are deposition and studied by transmission electron microscopy and electron back-scattering diffraction. At large distances from the cathode, the deposition rate R-d of Co is comparable with R-d values for vacuum are deposited Mo and Ni-Ti alloys and exceeds R-d obtained in magnetron sputter deposition. The vacuum are deposited coatings are formed from the multiply-charged ion flux and microparticles. The Co film formed from ions consists of a hexagonal close packed phase and possesses a dense microstructure with uniform and extremely small (5 nm) grains. The Co microparticles solidified after collision with a substrate have a metastable face centered cubic structure.