Thin Solid Films, Vol.330, No.2, 139-145, 1998
The effect of geometrical misfit dislocation on formation of microstructure and photoluminescence of Wurtzite GaN/Al2O3 (0001) films grown by low pressure metal-organic chemical vapor deposition
The incoherent GaN/sapphire interface and microstructure of GaN were observed by high resolution transmission electron microscopy. The most mobile 600 mixed-type dislocation is related to a structural metastability of the Wurtzite GaN film. In spite of the same feature of interband absorption, the photoluminescence mechanism is sensitive to deep level. A strong light emission from the bound exciton of Wurtzite GaN at 358 nm was observed in an n-type GaN sample with the GaN buffer layer. The donor-acceptor pair recombination at 380 nm with LO phonon replicas at 390 and 403 nm and the deep level at 559 nm a ere observed in both an undoped GaN sample with GaN buffer layer and an n-type GaN sample with AIN buffer layer. This optical behavior is sensitive to the Si doping and the type of buffer layer materials. The deep level emission along the dislocation line is suggested by the local band bending model providing the potential barrier of 0.63 eV by the space charge. PACS numbers : 61.72.Ff, 78.66.Fd, 64.80.Gd, 71.25.Tn.