Thin Solid Films, Vol.338, No.1-2, 88-92, 1999
Effect of the substrate temperature on the deposition of hydrogenated amorphous carbon by PACVD at 35 kHz
Hydrogenated amorphous carbon films were deposited using a 35 kHz rf-PACVD system varying the substrate temperature between 100 and 300 degrees C. The films were; ocharacterised using ellipsometry, electrical measurements, Raman spectroscopy, AES, EELS, RES and ERDA analysis. The films present a high sp(2) content with a hydrogen content around 40%, which decreases as we rise the substrate temperature. For temperatures above 200 degrees C, a graphitization process has been observed. The properties of the films have been compared with those obtained in conventional 13.56 MHz plasma systems.