The influence of a modulated crossed magnetic field on silicon particles hale been investigated by a laser light scattering method and a field emission scanning electron microscopy (FESEM) in SiH4(10%)/Ar plasmas. In the initial stage of silane discharge, the fluctuation of discharge current due to the modulated crossed magnetic field being applied is drastically decreased, then the density of silicon particles removed from the discharge space is increased and the average radius of the removed silicon particles is kept smaller than 10 nm of the detecting limit of FESEM. It is suggested that the small silicon particles in the stage of the initial growth are effectively removed from the discharge space and the fluctuation of discharge current is related to the nucleation and the growth of silicon particles.