Spatial distributions of sputtered particles during the de planar magnetron sputtering of indium-tin-oxide (ITO) target in 5 mTorr Ar/O-2 were measured by two-dimensional optical emission spectroscopy (2D-OES) and laser induced fluorescence spectroscopy (2D-LIF). Absolute number density of sputtered in atoms was determined by calibrating the LIF signal with Rayleigh scattering signal from Ar. The flux of atomic species onto the substrate were estimated from the experimental In density and the assumed average velocity of sputtered particles. Comparison between the total flux evaluated from experimental deposition rate and the atomic flux estimated above indicated that the flux of molecular species should exist according to the fractional ratio of introduced O-2 to Ar. Spatial inhomogeneity in film properties such as deposition rate and resistivity and the influence of oxygen partial pressure on them were discussed based on the 2D spatial profiles of sputtered species.