Thin Solid Films, Vol.346, No.1-2, 155-161, 1999
Effects of substrate temperature on the properties of tetrahedral amorphous carbon films
Tetrahedral amorphous carbon (ta-C) films were deposited by the filtered cathodic vacuum are technique with substrate temperature ranging from 25 to 400 degrees C. A transition from diamond-like properties to graphitic properties was observed for deposition above a threshold temperature value, which is found to increase from 200 to 300 degrees C for films deposited at different ion energies of 60 and 100 eV, respectively. These changes of properties upon transition include a change in the surface roughness, compressive stress and Raman spectra. The variation of results is consistent with the subplantation model, which emphasizes the role of carbon atoms trapped in the subsurface layers in the evolution of a dense sp(3) rich phase at room temperature. At higher temperature, diffusion of carbon atoms to the surface of the evolving film releases internal stress and leads to the formation of a graphitic sp(2) phase.
Keywords:DIAMOND-LIKE CARBON;ION ENERGY;GROWTH-CONDITIONS;ARCEVAPORATION;CATHODIC-ARC;RAMAN;DEPOSITION;SPECTROSCOPY;HARDNESS