화학공학소재연구정보센터
Thin Solid Films, Vol.358, No.1-2, 99-103, 2000
Preparation of ZnF2 and ZnF2-BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Crystalline and amorphous ZnF2 and ZnF2-BaF2 thin-films were prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition. The Zn and Ba beta-diketone chelates and an NF3 gas were used as starting materials and a fluorinating gas, respectively. Crystalline and transparent ZnF2 thin-films were obtained on CaF2(111) substrates kept at 300 degrees C at the deposition rates of 0.2-0.8 mu m/h. The thin film prepared at the 0.2 mu m/h deposition rate was oriented along a [110] direction. The ZnF2 thin-film deposited on a substrate kept at 100 degrees C was amorphous though it tinted yellowish brown and had IR absorption bands due to contaminants. Colorless and contaminant-free amorphous thin-films were obtained in a 60ZnF(2).40BaF(2) composition.