The localized electrochemical deposition of metals using a pulled micropipette as tip (similar as in scanning ion-conductance microscopy) is a new scanning probe lithography method, which is still under development. This paper investigates the dependence of the deposited structures on the deposition parameters (electrode potentials, tipsample distance). A 2D numerical simulation is used to visualize the potential distribution in the present geometry. A linear copper structure (300 mu m long and 100 mu m broad) has been produced in a first experiment.