Thin CNx films were deposited by combination of KrF pulse laser deposition with additional radio frequency discharge (13.56 MHz). Nitrogen pressure was changed from 1 to 40 Pa and the r.f. power was adjusted to 100 W. N/C ratio in films higher than 1.1 was measured by wavelength dispersive X-ray analysis. Films were amorphous. Microhardness from 2 to 9 GPa and adhesion to silicon substrate from 5 to 19 N were found. The X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and Raman spectral studies indicate N-sp(3) C, N-sp(2) C and N-sp C bondings of nitrogen atoms with respect to carbon and the presence of N-H groups. The presence of different amorphous, crystalline and polymer-like phases is discussed.