We succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs (self-assembled monolayers). SAMs of OTS (octadecyltrichloro-silane) were formed on Si wafers, and were modified by UV irradiation using a photomask to generate methyl/silanol-pattem. They were used as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloride diethoxide). Amorphous films with approximate compositions Ti/O/CI/C = 1:2.2:0.17:0.37 were selectively deposited on silanol regions. Line width variation of the pattern of an as-deposited film was improved to be well below the electronics design rule, 5%. Annealing the films at high temperatures (400-600 degreesC) gave rise to an anatase phase, while the resolution of a micropattern remained unchanged.