Thin Solid Films, Vol.383, No.1-2, 292-295, 2001
Thin film microfabrication of gold microelectrodes functionalized with thiacalix[4]arene layer: applications to copper ion sensor
Thin-film technology of the microelectrode was done using selected protective photoresist combined with chemical/plasma etching. In order to functionalize the prepared gold microelectrodes, a thin thiacalix[4]arene film was deposited using a thermal evaporation technique in a vacuum. The thiacalix[4]arene/microelectrodes have shown good sensitivity and a low detection limit (approx. 10(-7) M) for Cu(II) ions.