Through-mask electrochemical micromachining has been employed to fabricate well-defined three-dimensional topographies in titanium. Well-controlled shapes with a smooth surface finish were obtained using optimized electrolyte composition and electrochemical parameters. The shape change resulting from electrochemical etching through patterned photoresists were numerically simulated using the boundary element method, assuming the rate of titanium dissolution to be diffusion controlled. A satisfactory agreement was found between experimentally measured and simulated etched profiles.