We report herewith new experimental data concerning the synthesis of carbon-nitride thin films by reactive pulsed laser deposition (lambda = 248 nm, tau (FWHM) less than or equal to 30 ns) from a graphite target in low pressure nitrogen (0.2, 1 and 50 Pa) at a level of the incident laser fluence of 22 J/cm(2). The obtained structures were studied by Raman spectrometry and microhardness determinations. We have observed that an increase of the N-2 pressure leads to an increase in the N-2 content in the deposited films but causes the reduction of the amount of the sp(3) bounded C and the decrease of the microhardness of the obtained structures.