Demand for higher polymer performance with very short cure times has resulted in the development of low energy electron beam processes. This article presents the results of such a process for curing two epoxy systems, namely 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexane carboxylate and di-glycidyl ether of bisphenol A (DGEBA), using the cationic photoinitiator salts, triarylsulfonium hexafluoroantimonate, and diaryliodonium hexafluoroantimonate, respectively. Glass transition temperature measurements were done using a modulated DSC method while the degree of conversion was measured using FTIR spectroscopy. Results indicate that for both epoxy systems a relatively low dosage of not more than 5 Mrad was sufficient to achieve up to 60% conversion, with up to 80% conversion achievable using 30 Mrad. The diaryliodonium salt appeared to be more effective than the sulphonium salt in the above study. The effect of varying photoinitiator concentration and the resulting glass transition temperature has been studied.