화학공학소재연구정보센터
Canadian Journal of Chemical Engineering, Vol.72, No.3, 476-483, 1994
Thermal Plasma Production of Fumed Silica - The Effect of Quench Conditions on Thickening and Thixotropic Ability
The effect of quench conditions on the thickening and thixotropic ability of fumed silica was studied. The powder was generated by rapidly quenching a vapour stream containing SiO(g) with steam. Silicon monoxide vapour was produced by decomposing quartz in a transferred arc reactor using an Ar/NH3 thermal plasma. The parameters investigated included pre-quench temperature (1100 - 2100 K), and supersaturation ratio (1 - 10(7), quench rate (17000 - 75000 K/s), and quench stoichiometry (27 - 84), which was defined as the molar ratio of steam to SiO. The thickening and thixotropic ability of the powders increased with increasing quench rate and decreasing pre-quench supersaturation. This was due to an increase in specific surface area. Use of large H2O/SiO ratios caused a high degree of surface hydroxylation.