The interaction of water vapor with clean and boron-modified Ni-3(Al,Ti) surfaces was studied with temperature-programmed desorption, X-ray photoemission, and Auger electron spectroscopy. Thermal desorption results indicate that water dissociates on clean boron-free Ni-3(Al,Ti) (110) surfaces, resulting in hydrogen evolution at similar to 400 K. X-ray photoemission studies show that water dissociation occurs above 190 K. Hydrogen desorption at similar to 400 K is completely suppressed by boron adsorption at a coverage of about 0.3 monolayer. Anger and X-ray photoemission studies on boron-modified Ni-3(Al,Ti) (110) surfaces show that boron reacts with water to form hydroxyl at 130-190 K. Hydrogen desorption occurs at similar to 950 K from boron-modified Ni-3(Al,Ti) (110) surfaces, indicating strong B-H bonding.