Titanium oxide films are deposited on low temperature isotropic carbon (LTI-carbon) by ion beam enhanced deposition (IBED). The chemical composition of the prepared films is analyzed by using X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectroscopy (RBS). The structure of the prepared films is studied by glancing angle X-ray diffraction (GAXRD) and transmission electronic microscopy (TEM). The surface morphology of the film is observed by means of atomic force microscopy (AFM). The results show that the prepared films are polycrystalline with TiO, Ti2O3 and TiO2 as coexisting phases. The chemical composition is mainly influenced by O-2 pressure. The higher the O-2 pressure is, the higher the ratio of O/Ti is. The cross-sectional high resolution electron microscopy image show that a 'titanium oxide/amorphous transitional layer/LTI-carbon' layered structure has been formed. The structure of the films prepared at 80 keV, is more complex than that of the film prepared at 40 keV, as well as that the surface morphology of the film prepared at 80 keV is rougher.