화학공학소재연구정보센터
Thin Solid Films, Vol.386, No.2, 239-242, 2001
Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling
Plasma structure in an inductively coupled plasma reactor is numerically investigated in electropositive Ar and electronegative CF4 under the lowest sustaining condition. In the case of Ar, the discharge is maintained under the influence of an azimuthal electric field, whilst the CF4 plasma is electrostatically sustained by a radial field under the presence of negative ions F-.