Thin films of indium-tin oxide (ITO) were formed on glass substrate via a chemical solution deposition method. Indium nitrate coordinated with 2,4-pentanedione and ethylene glycol, and tin oxalate were used as the raw materials of the coating solution. Composition ratios of Sn/In were varied between 0 and 14 mol%. The solutions were coated on non-alkali glass substrate using a spin-coating process. Then, the coated glass was fired in air to thermally decompose the precursors and to densify the coating. The resistivity of the coatings fired in air at 300 degreesC was 5.0 Omega cm and decreased at higher firing temperatures. The resistivity of the coatings fired at 700 degreesC was 2.8 x 10(-3) Omega cm, which is more than 10 times higher than that of ITO coatings formed by the sputtering process. A post-annealing in non-oxidizing atmospheres such as vacuum, N-2, Ar and H-2/Ar after the firing lowered the resistivity of the coating. Treatment in hydrogen-containing atmosphere was particularly effective in lowering the resistivity of the coating to 6.2 X 10(-4) Omega cm. It was found that the decomposition of organic residues and formation of oxygen vacancies in the coatings were promoted by the hydrogen treatment.