We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N-2) microdischarge hollow cathode lamp (N-2 MHCL) as a light source of the atomic nitrogen (N) resonance Lines for measuring absolute N densities in process plasmas. The estimations of self-absorption and the emission line profiles of the N-2 MHCL, which are necessary for absolute N density determination, were carried out. The measurement of absolute N densities have been demonstrated for an inductively coupled N-2 plasma using the VUVAS system employing the N2MHCL.