Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.19, No.2, 689-692, 2001 DOI10.1116/1.1349198 Export Citation Analysis of the molecular structure of fluorocarbon deposits produced by C4F8 and C4F8-H-2 plasmas Takada N, Shibagaki K, Sasaki K, Kadota K, Oyama KI Please enable JavaScript to view the comments powered by Disqus.
