An experiment was performed to investigate the transport characterization of reactive off-axis sputtering deposition. Due to the collision and/or thermalization process between the sputtered species and background gases, three transport regions were observed when the growth pressures were varied from 5 to 150 mTorr. A gravity-related phenomenon was revealed in film growth at relatively high growth pressures by measuring film growth rate at two depositing orientations, which was either parallel or perpendicular to the gravity vector. In this study, possible design for the substrate holder orientation in the off-axis sputtering system was also suggested.