A polyvinyl alcohol-slurry screening technology of phosphors was studied for field emission displays with a resolution up to supervideo graphics adapter. Phosphor lines were successfully patterned as narrow as 25 mu m on 6 in. glass substrates. Process conditions such as spin coating speeds, exposure time, and shadow mask layout for photolithography were related to thickness and line resolutions of phosphor. Luminance characteristics of phosphors were optimized in terms of firing processes. For ZnS:Cu, Al, ZnS:Ag, Cl, and Y2O3:Eu phosphors, the firing temperature was optimized to be 400 degrees C. The nitrogen ambient during the cooling process improves the stability of phosphor surface.