A 50 keV multibeam test bed incorporating a photocathode and multiple modulated light beams has been developed and constructed. The column allows for a detailed evaluation of both the photocathode sources and the electron optics for sub-100 nm lithography applications and is designed to reduce electron-electron (e-e) interactions. The basic constraints determining the performance of the multibeam electron column are discussed. Results have been obtained using gold photocathodes at beam energies varying from 10 to 50 kV, allowing the experimental evaluation of key design parameters.