Using the hot filament chemical vapor deposition method, patterned nanostructured carbon films with excellent field emission characteristics have been deposited at the nominal substrate temperatures of 540 degreesC and 450 degreesC on sodalime glass substrates. These films have demonstrated a good visual emission uniformity and good current stability during the continuous operation for 140 h. Taking advantage of the poor adhesion of the nanostructure carbon without a chrome interlayer and selective growth-on the metal catalyst, the formation of the patterned nanostructured carbon films has been carried out via the prepattering of the chrome electrodes and/or metal catalyst using the conventional phorolithography process. An example of the patterned emitter with high complexity is presented to demonstrate the feasibility of practical emitter fabrication using nanostructured carbon films.