Enhanced pattern area density proximity effect correction (EPADPEC) is an algorithm for performing electron proximity effect correction for direct write electron beam systems. The algorithm is described in C. S. Ea and A. D. Brown [J. Vac. Sci. Technol. B 17, 323 (1999)]. In this article, we describe a corner correction scheme for EPADPEC. The scheme reduces the pullback radius and the absolute area difference at shape corners by at least a factor of 2, at a computation cost increase of 1.7-5.9.