Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.18, No.10, 789-791, 1999 DOI10.1023/A:1006689017053 Export Citation A new metal-organic precursor for the low-temperature atmospheric pressure chemical vapor deposition of zinc oxide films Suh S, Hoffman DM, Atagi LM, Smith DC Please enable JavaScript to view the comments powered by Disqus.
