촉매벽 반응기를 이용한 CO 산화반응 연구

박승두; 이인화; 최명재; 홍석인

HWAHAK KONGHAK, Vol.30, No.5, 571-577, October, 1992

Export Citation

촉매벽 반응기를 이용한 CO 산화반응 연구

A Study of CO Oxidation Reaction Using Catalytic Wall Reactor

박승두, 이인화, 최명재, 홍석인

초록

알루미늄관의 내부벽을 양극산화시켜 알루미나층을 형성시킨 후, 백금 및 팔라듐을 알루미나 층에 담지시켜 촉매벽 반응기를 제작하였다. CO 산화반응을 모델반응으로 선택하여 이 반응기의 성능을 조사하였다. 양극산화의 조건을 조절함으로써 촉매의 담지정도를 조절할 수 있었다. 반응기의 길이를 조절하여 90% 이상의 전환율을 얻을 수 있었으며, Senkan식을 보정하여 저온과 고온영역에서 잘 맞는 다음과 같은 새로운 실험을 제시하였다. dξ / dz = -(0.154 / Dε)Re_o^-0.13Sc_o^-2/3ln (1+εξ / 1+ε) P (-∞≤Z≤T_o-μ/σ)

The layer of alumina was formed in the inside of the aluminum tube by anodic oxidation, and Pt, Pd catalysts were impregnated on the alumina layer to make catalytic wall reactor. The CO oxidation reaction was investigated for the performance of this reactor as the model reaction. By controlling of the anodizing conditions, the extent of impregnation could be regulated. And by controlling the lengths of reactors, the conversion of over 90% could be obtained. A new empirical equation which was good consistent with the results was suggested by modifying the Senkan’s equation. dξ / dz = -(0.154 / Dε)Re_o^-0.13Sc_o^-2/3ln (1+εξ / 1+ε) P (-∞≤Z≤T_o-μ/σ)

[References]

Baron T, Manning WR, Johnstone HF, Chem. Eng. Prog., 48, 125 (1952)
Smith TG, Carberry JJ, Chem. Eng. Sci., 30, 221 (1975)
Diggl JW, Downie TC, Goulding CW, Chem. Rev., 69, 365 (1969)
Keller F, Hunter MS, Robinson DL, J. Electrochem. Soc., 100, 411 (1953)
Renshaw TA, J. Electrochem. Soc., 108, 185 (1961)
Franklin RW, Stirland DJ, J. Electrochem. Soc., 110, 262 (1963)
Yoo BK, Choi MJ, Lee IW, Hong SI, HWAHAK KONGHAK, 27(6), 833 (1989)
Senkan SM, Evans LB, Howard JB, Ind. Eng. Chem. Process Des. Dev., 15, 184 (1976)

[Referenced By]

[1] Baron T, Manning WR, Johnstone HF, Chem. Eng. Prog., 48, 125 (1952)

[2] Smith TG, Carberry JJ, Chem. Eng. Sci., 30, 221 (1975)

[3] Diggl JW, Downie TC, Goulding CW, Chem. Rev., 69, 365 (1969)

[4] Keller F, Hunter MS, Robinson DL, J. Electrochem. Soc., 100, 411 (1953)

[5] Renshaw TA, J. Electrochem. Soc., 108, 185 (1961)

[6] Franklin RW, Stirland DJ, J. Electrochem. Soc., 110, 262 (1963)

[7] Yoo BK, Choi MJ, Lee IW, Hong SI, HWAHAK KONGHAK, 27(6), 833 (1989)

[8] Senkan SM, Evans LB, Howard JB, Ind. Eng. Chem. Process Des. Dev., 15, 184 (1976)