Ni/SiO<SUB>2</SUB> 촉매에 의한 메탄올 분해반응속도

윤기준; 정경숙; 이재의

HWAHAK KONGHAK, Vol.31, No.5, 569-576, October, 1993

Export Citation

Ni/SiO₂ 촉매에 의한 메탄올 분해반응속도

Kinetics of Methanol Decomposition over Ni/SiO₂

윤기준, 정경숙, 이재의

초록

Ni/SiO₂ 촉매를 사용하여 온도 473-553K, 메탄올 분압 0.141기압 이하의 범위에서 관형 흐름반응기를 사용하여 메탄올 분해반응을 수행하였다. 주 생성물은 H₂와 CO이었으며, 부산물로 소량의 CH₄가 생성되었다. CH₄ 생성량은 온도가 높아짐에 따라 점차 증가하였으나 CO의 선택도가 95% 이상을 나타내었다. 다음과 같은 분해반응속도식을 제안하고 실험 자료로부터 반응속도론적 매개변수값을 결정하였다. -r_A= k_sK_AP_A / (1+K_AP_A)²

Decomposition of methanol over a Ni/SO₂ catalyst was carried out using a tubular flow reactor in a temperature range between 473 and 533K. The partial pressure of methanol was below 0.141 atm. H₂and CO were the major decomposition products, and a small amount of CH₄ was produced. Although the amount of CH₄ formed increased with temperature, the selectivity to CO was greater than 95%. The following rate equation was proposed and the kinetic parameter values were eveluated. -r_A=k_sK_AP_A/(1+K_AP_A)²

[References]

서곤, 촉매, 4(2), 125 (1988)
하백현, 촉매, 7(1), 10 (1991)
Miyazaki E, Yasumori I, Bull. Chem. Soc. Jpn., 40, 2012 (1967)
Madhusudhan RV, Shankar V, J. Chem. Technol. Biotechnol., 42, 183 (1988)
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Richter LJ, Ho W, J. Vac. Sci. Technol. A, 3, 1549 (1985)
Richter LJ, Ho W, J. Chem. Phys., 83, 2569 (1985)
Bare SR, Stroscio JA, Ho W, Surf. Sci., 150, 399 (1985)
Steinbach F, Krall R, Cai JX, Kiss J, Proceed. 8th Int. Congr. Catal., Vol. 3, 359, Dechema, Frankfurt (1984)
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[Referenced By]

[1] 서곤, 촉매, 4(2), 125 (1988)

[2] 하백현, 촉매, 7(1), 10 (1991)

[3] Miyazaki E, Yasumori I, Bull. Chem. Soc. Jpn., 40, 2012 (1967)

[4] Madhusudhan RV, Shankar V, J. Chem. Technol. Biotechnol., 42, 183 (1988)

[5] Imai T, Shokubai, 28, 195 (1986)

[6] Yasumori I, Nakamura T, Miyazaki E, Bull. Chem. Soc. Jpn., 40, 1372 (1967)

[7] Gasser RPH, Roberts K, Stevens AJ, J. Catal., 37, 179 (1975)

[8] Gates SW, Russel JN, Yates JT, J. Catal., 92, 25 (1985)

[9] Rubloff GW, Demuth JE, J. Vac. Sci. Technol., 14, 419 (1977)

[10] Demuth JE, Ibach H, Chem. Phys. Lett., 60, 395 (1979)

[11] Richter LJ, Ho W, J. Vac. Sci. Technol. A, 3, 1549 (1985)

[12] Richter LJ, Ho W, J. Chem. Phys., 83, 2569 (1985)

[13] Bare SR, Stroscio JA, Ho W, Surf. Sci., 150, 399 (1985)

[14] Steinbach F, Krall R, Cai JX, Kiss J, Proceed. 8th Int. Congr. Catal., Vol. 3, 359, Dechema, Frankfurt (1984)

[15] Dietz WA, J. G.C., 68 (1967)

[16] Wade LE, Gengelback RB, Trumbley JL, Hallbauer WL, "Kirk-Othmer Encyclopedia of Chemical Technology," 3rd ed., vol. 15, p. 398, Willey, New York (1981)

[17] Benson JE, Boundart M, J. Catal., 4, 704 (1965)

[18] McCarty JG, Wise H, J. Catal., 57, 406 (1979)

[19] Moon SH, Yoon KE, Kim YG, Korean J. Chem. Eng., 3(1), 61 (1986)