화학공학소재연구정보센터
Journal of Chemical Technology and Biotechnology, Vol.75, No.9, 817-827, 2000
Decomposition of ethoxyethane in the cold plasma environment
A radio frequency (RF) plasma system was used to decompose the ethoxyethane (EOE) contained gas. The reactants and final products were analyzed by using an FTIR (Fourier Transform Infrared) spectrometer. The effects of plasma operational parameters, including input power wattage (W), equivalence ratios (Phi), feeding concentration (C) of EOE and total gas flow rate (Q) for EOE decomposition were evaluated. In addition, the possible reaction pathways for EOE decomposition and the formation of final products were built up and are discussed in this paper. The mole fraction profiles of C2H5OC2H5, CN3CHO, CH4, C2H6, C2H4, C2H2, CO2 and CO were detected and are also presented in this paper. At lower input power wattages, the creation of glow discharge is strongly dependent on the plasma production index (PPI). When input power wattages are smaller than 30 W, the minimum values of PPI to create glow discharge ranged between 18.2 and 19.0. The results of this study revealed that, in the RF plasma reactor, the decomposition fraction of EOE could reach 100% under most operational conditions.