Chemical Aerosol Deposition에 의한 막형성

김경동; 이수근; 김선근

HWAHAK KONGHAK, Vol.31, No.6, 776-787, December, 1993

Export Citation

Chemical Aerosol Deposition에 의한 막형성

Formation of Thin Film by Chemical Aerosol Deposition

김경동, 이수근, 김선근

초록

Chemical aerosol deposition에 의하여 TiO₂의 막형성을 실험과 이론을 통하여 살피었다. 운반기체의 유량, 노즐-기판 거리, 기판온도를 주 공정변소로 선택하여 실험을 행하여 퇴적효율, 막두께 및 그 분포에 미치는 영향을 조사하였다. 퇴적효율과 막두께 모두 운반기체 유량과 기판온도가 커질수록, 거리는 가까워질수록 증가하였으며 심할 경우 퇴적막의 한가운데 골이 형성되었다. 노즐-기판사이의 유동과 온도장을 계산하고 입자의 증발과 운동방정식을 수치적으로 풀어 입자의 궤적, 증발현상을 살피었다. 입자의 증발이 급격히 일어나 액체 방울, 즉 에어로졸의 존재영역이 명확해지며 이 영역이 막의 퇴적효율과 막두께에 결정적 요소임을 밝히었다.

Formation of TiO₂ film by chemical aerosol deposition(CAD) has been investigated experimental-ly and theoretically. The carrier gas Flow rate, the nozzle-to-substrate distance and the substrate temperature were chosen as major process variables and the experimental work has been carried out to find their effects on the deposition efficiency, the film thickness and its distribution. Both the deposition effeiciency and the film thickness increased with the carrier gas flow rate and the substrate temperature but decreased with the nozzle-to substrate distance. Especially at higher rate of the film deposition, the central part of the film had a concave surface like a valley. The flow and the temperature fields of the fluid phase in the region between the nozzle and the substrate were calculated numerically. The the particle trajectories and their evaporation were also simulated numerically from the equations of both particle motion and evaporation. As a result, the evaporation of the liquid particles was to occur abruptly so that the liquid-phase region had a clear boundary. The extent of the region was found to be a determining factor in the film deposition, which characterizes the chemical aerosol deposition.

[References]

Derraa M, Sayer M, J. Appl. Phys., 68, 1401 (1990)
Chamberlin RR, Skarman JS, J. Electrochem. Soc., 113, 86 (1966)
Futamoto M, Honda Y, Jpn. J. Appl. Phys., 27(1), L73 (1988)
Morosanu CE, "Thin Films Science and Technology," Elsevier, New York, 7, 47 (1990)
Chopra KL, Kainthla RC, Pandya DK, Thakoor AP, "Physics of Thin Films," ed. by Hass, G., Francombe, M.H. and Vossem, Y.L., Academic Press, New York, 12, 167 (1982)
Rodes C, Smith T, Crouse R, Ramachandran G, Aerosol Sci. Technol., 13, 220 (1990)
Reist PC, "Introduction to Aerosol Science," Macmillan Pub. Co., New York (1984)
Bird RB, Stewart WE, Lightfoot EN, "Transport Phenomena," Wiley, New York (1960)
Hidy GM, Brock JR, "The Dynamics of Aerocolloidal Systems," Pergamon Process, New York (1971)
Boothroyd RG, "Flowing Gas-Solid Suspension," Chapman and Hall, London (1971)
Fuchs NA, "The Mechanics of Aerosols," Pergamon, Oxford (1964)
Hinds WC, "Aerosol Technology," Wiley, New York (1982)
Flagan RC, Seinfeld JH, "Fundamentals of Air Pollution," Prentice Hall, New Jersey, 315 (1988)
Peters MH, Cooper DW, Miller RJ, J. Aerosol Sci., 20(1), 123 (1989)
Kahaner D, Moler C, Nash S, Numerical Methods and Software, Prentice-Hall, Englewood Cliffs, NJ (1989)

[1] Derraa M, Sayer M, J. Appl. Phys., 68, 1401 (1990)

[2] Chamberlin RR, Skarman JS, J. Electrochem. Soc., 113, 86 (1966)

[3] Futamoto M, Honda Y, Jpn. J. Appl. Phys., 27(1), L73 (1988)

[4] Morosanu CE, "Thin Films Science and Technology," Elsevier, New York, 7, 47 (1990)

[5] Chopra KL, Kainthla RC, Pandya DK, Thakoor AP, "Physics of Thin Films," ed. by Hass, G., Francombe, M.H. and Vossem, Y.L., Academic Press, New York, 12, 167 (1982)

[6] Rodes C, Smith T, Crouse R, Ramachandran G, Aerosol Sci. Technol., 13, 220 (1990)

[7] Reist PC, "Introduction to Aerosol Science," Macmillan Pub. Co., New York (1984)

[8] Bird RB, Stewart WE, Lightfoot EN, "Transport Phenomena," Wiley, New York (1960)

[9] Hidy GM, Brock JR, "The Dynamics of Aerocolloidal Systems," Pergamon Process, New York (1971)

[10] Boothroyd RG, "Flowing Gas-Solid Suspension," Chapman and Hall, London (1971)

[11] Fuchs NA, "The Mechanics of Aerosols," Pergamon, Oxford (1964)

[12] Hinds WC, "Aerosol Technology," Wiley, New York (1982)

[13] Flagan RC, Seinfeld JH, "Fundamentals of Air Pollution," Prentice Hall, New Jersey, 315 (1988)

[14] Peters MH, Cooper DW, Miller RJ, J. Aerosol Sci., 20(1), 123 (1989)

[15] Kahaner D, Moler C, Nash S, Numerical Methods and Software, Prentice-Hall, Englewood Cliffs, NJ (1989)