Thin Solid Films, Vol.403-404, 148-152, 2002
US and CdTe large area thin films processed by radio-frequency planar-magnetron sputtering
We present in this work the processing of large area US and CdTe thin films. We have been working for this purpose with a Radio-Frequency Planar Magnetron Sputtering (RF-PMS) system with two 6-inch balanced guns, processing thin films in areas as large as 450 cm(-2) grown on soda-lime glasses. Conducting glasses (SnO2 of 7 Omega/square) were also used only for CdS deposition in order to further analyze the heterojunction CdS/CdTe. The best films have been processed with substrate temperatures (T-s) of 250degreesC for US and 215degreesC for CdTe, Ar chamber-pressure of 20 mtorr, radio frequency power of 300 W, and different deposition time between target materials.
Keywords:CdS;CdTe;radio-frequency planar-magnetron sputtering;X-rays;photoluminescence resistivity;optical absorbtion