The deposition of Cu at room temperature on a V2O3(0001) surface, which was prepared on a Re(0001) substrate at first, is studied by XPS (X-ray photoelectron spectroscopy), UPS (ultraviolet photoelectron spectroscopy), and LEED (low-energy-electron diffraction). The XPS results indicate that the growth of Cu follows the patch-wise Stranski-Krastanov mode. Auger parameter and UPS show that at low coverages the deposited Cu has the Cu(I) state due to the interaction of Cu with V2O3 substrate; Cu becomes metallic at Cu coverage > 2 MLE (monolayer equivalent). The epitaxial Cu films on the V2O3(0001) have Cu(111)R30degrees superstructures observed by LEED.