Highly (006)-oriented lithium niobate-tantalate (LiNb(0.5)Tk(0.5)O(3) and LiNb0.2Ta0.bO3) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation.