A novel method for the fabrication of directly photopatternable pure and antimony-doped organo tin polymers via free-radical polymerization is presented. With all synthesized materials, 3 mum feature sizes can be photopatterned by using a mercury I-line UV-lamp. Photopolymerized organo tin films are crystallized by thermal annealing to obtain conductive pure or antimony-doped tin dioxide thin films. The results indicate that the direct photopatterning process increases the conductivity of fabricated films with all Sb-doping concentrations in comparison with the films fabricated without direct photopatterning. The smallest obtained resistivity for the single layer structure was 0.08 Ohm cm.