Single and multilayer boron nitride and boron carbide films were grown using d.c. magnetron sputtering in a single cathode deposition system. High frequency pulsed bias voltages were applied to both the target and the substrate during deposition. An external solenoid was utilized to increase the ion flux during deposition. Momentum of incident ions was found to play a key role for cubic BN:C formation. Multilayer film growth was investigated as a way to obtain thick and adherent cubic boron nitride containing coatings. Boron carbide films were found to have a hardness exceeding 40 GPa and a smooth surface morphology (r.m.s. roughness 0.1-0.15 nm), high elasticity, and high wear resistance.