Electrochimica Acta, Vol.47, No.25, 4011-4018, 2002
Observation of initial deposition process of electroless nickel plating by quartz crystal microbalance method and microscopy
The initial deposition process of electroless nickel plating was investigated by combining a quartz crystal microbalance (QCM) method with microscopy. The authors found an anomalous deposition rate in the initial deposition and four stages were noted: an induction period before the initiation of deposition, an acceleration period with an increase in the deposition rate, a deceleration period with a decrease in the deposition rate and a stationary period at a constant deposition rate. The practical surface area of the deposits increased until the deposits became continuous and reached a constant value. On the other hand, the deposition rate per unit practical surface area decreased monotonously as the deposition proceeded. As a result, an anomalous initial deposition rate was observed. The four periods also appeared in the deposition when the catalyzation process was repeated 4 times. In this case, the number of grains at the initial stage was greater, and nucleation still continued until the deposits became continuous. The initial deposits, therefore, became continuous at lower thickness.
Keywords:electroless plating;initial deposition;quartz crystal microbalance;microscopy;deposition rate