화학공학소재연구정보센터
Journal of Colloid and Interface Science, Vol.252, No.1, 256-258, 2002
Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates
A study is made by means of Monte Carlo (MC) simulations of the kinetics of random sequential adsorption (RSA) of dimers and linear and bent trimers on some geometrically disordered substrates. The MC data are explained by a semiempirical equation whose parameters interpret the jamming fraction of the process and some geometric characteristics of the systems studied.