Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.21, No.8, 635-637, 2002 DOI10.1023/A:1015644206234 Export Citation Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition Wang D, Wang M, Xu XH, Hou Y, Wang H, Han H Please enable JavaScript to view the comments powered by Disqus.
