화학공학소재연구정보센터
Thin Solid Films, Vol.416, No.1-2, 10-15, 2002
Mechanism of electrical conduction in plasma polymerized furfural thin films
Polyfurfural thin films lying in the thickness range of 1300-2000 Angstrom were prepared by ac plasma polymerization technique. The current-voltage characteristics in symmetric and asymmetric electrode configuration were studied with a view to determining the dominant conduction mechanism. It was found that the Schottky conduction mechanism is dominant in plasma polymerized furfural thin films. The predoininance of Schottky mechanism was further confirmed based on the thermally stimulated current measurements.