The pulsed laser deposition (PLD) of tin oxide (SnO2) thin films onto both alumina and quartz substrates have been achieved by ablating poly-SnO2 pellets with a KrF excimer laser. At a laser fluence of similar to4.6 J/cm(2), the effect of both back-round pressure (vacuum and 150 mTorr of oxygen) and deposition temperature (T-d ranging from 20 to 600 degrees C) were investigated. While all the films deposited under 150 mTorr of oxygen consisted of pure polycrystalline SnO2 phase and were almost stoichiometric ([O]/[Sn] similar to1.9) even for T-d as low as 20 T-d those deposited under vacuum were found to be composed of both amorphous SnO and poly-SnO2 phases. Scanning and transmission electron microscopy observations have revealed that the micro-/nano-structure of the PLD SnO2 films changes from a relatively porous fine-grained to a completely columnar microstructure as T-d is raised from 20 to 600 T. In particular, the average diameter of the SnO2 nanograins was found to increase markedly (from 4 to similar to12 nm) when T-d is increased from 20 to 450 degrees C and above. On the other hand, the resistivity (rho) of the PLD SnO2 films, deposited under 150 mTorr of oxygen, was found to decrease significantly from 200 to similar to2 Omega cm when T-d is increased from 150 to 450 degrees C. The optical band gap (E-g) of the PLD SnO2 films increased from similar to2.6 to similar to4.0 eV when the deposition environment is changed from vacuum to 150 mTorr of oxygen while it is slightly affected by the variation of T-d. The observed variations of rho and E-g are correlated to nanograin size variation and oxygen vacancies concentration in the films, respectively.