Electron projection lithography (EPL) is one of the leading candidates for the sub-65 nm lithography node. The development of a low-distortion mask is critical to the success of EPL. This article proposes and analyzes two new EPL mask formats described as a "corrugated-continuous membrane mask" and a "carbon-continuous membrane mask." Novel process flows for the manufacture of these masks have been developed at Team Nanotec GmbH. Resonant frequency stress measurements of the. ultrathin membrane bilayers were completed and subsequently used in the finite element simulation of the mask fabrication and pattern transfer. The new mask types have the benefits of the lower distortions of a typical continuous membrane mask, but maintain the advantage of the higher throughput stencil format because of the ultrathin films. In addition, the proposed masks remove the need for pattern splitting typically used with complementary systems.